关键词: 多晶硅, 四氯化硅, 三氯氢硅, 氢化反应, 等离子体

Abstract: The modified Siemens method is the mainstream process of polysilicon production, of which silicon tetrachloride hydrogenation technology is the critical improvement. Traditional thermal hydrogenation and low-temperature hydrogenation suffer from the shortcomings of high energy consumption and low conversion rate. This review gives a general introduction of the preparation of trichlorosilane by plasma hydrogenation of silicon tetrachloride, which can be classified into thermal and cold plasma hydrogenation methods. Thermal plasma hydrogenation methods are presented, mainly including DC discharge plasma, high pressure RF plasma, low pressure RF plasma, and microwave plasma method. The cold plasma hydrogenation methods are also discussed, with a further introduction and experimental exploration of the dielectric barrier discharge (DBD) plasma method. Through comprehensive classification and discussion, key challenges in industrialization of plasma hydrogenation are brought forward, and the advantages and disadvantages of the methods are summarized, and the application foreground is expected.

Key words: polysilicon, silicon tetrachloride, trichlorosilane, hydrogenation, plasma