双介质阻挡放电低温等离子体对模拟堆肥气体中氨气的去除

doi:10.16085/j.issn.1000-6613.2019-1851

摘要/Abstract

摘要：

针对固体废物堆肥设施氨气污染问题，本文首次运用双介质阻挡放电低温等离子体（DDBD）技术去除模拟堆肥气体中的氨气。考察了输入功率、氨气流速、氨气初始浓度、反应器放电间隙、氧气含量等参数对氨气去除率和低温等离子体系统能量效率的影响，并分析了副产物的生成情况及其影响因子。研究结果表明，氨气去除率与输入功率和氧气含量呈正相关，与氨气流速和氨气初始浓度呈负相关。低温等离子体系统的能量效率与氨气流速、氨气初始浓度、氧气含量均正相关，但随输入功率的增加先升高后降低。研究发现，在所设定的反应条件下，4mm放电间隙反应器的能耗最低，能量效率最高。O₃和NO_x是DDBD去除氨气的反应副产物，其浓度均与氧气含量呈正相关，均呈现随输入功率的增加先升高后降低的趋势。

关键词: 双介质阻挡放电, 等离子体, 氨气, 环境, 污染, 降解

Abstract:

Aiming at ammonia gas pollution produced by solid waste composting facilities, the double dielectric barrier discharge non-thermal plasma (DDBD) technology was used to remove ammonia gas from simulated composting gas. This study investigated the effects of input power, ammonia flow rate, initial ammonia concentration, reactor discharge gap and oxygen content on the ammonia gas removal efficiency and energy efficiency. Meanwhile, the formation of by-products with its influencing factors were explored. The results showed that ammonia gas removal efficiency was positively correlated with input power and oxygen content, while it was negatively associated with ammonia flow rate and initial ammonia concentration. The energy efficiency was positively correlated with ammonia flow rate, initial ammonia concentration, and oxygen content, however, it increased first and then decreased with the increase of input power. It revealed that the energy consumption was the lowest and the energy efficiency was the highest in the reactor with 4mm of discharge gap under the controlled conditions. The concentrations of the by-products, O₃ and NO_x, were positively correlated with oxygen content. All of them increased first and then decreased with the increase of input power.

Key words: double dielectric barrier discharge, plasma, ammonia gas, environment, pollution, degradation

中图分类号:

X512

代辉祥, 陆文静, 李超, 王前. 双介质阻挡放电低温等离子体对模拟堆肥气体中氨气的去除[J]. 化工进展, 2020, 39(9): 3801-3809.

Huixiang DAI, Wenjing LU, Abbas YAWAR, Chao LI, Qian WANG. Removal of ammonia from simulated composting gas by double dielectric barrier discharge plasma[J]. Chemical Industry and Engineering Progress, 2020, 39(9): 3801-3809.

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