Chemical Industry and Engineering Progress ›› 2023, Vol. 42 ›› Issue (4): 1944-1960.DOI: 10.16085/j.issn.1000-6613.2022-1132
• Materials science and technology • Previous Articles Next Articles
WAN Maohua1(), ZHANG Xiaohong2, AN Xingye1(), LONG Yinying1, LIU Liqin1, GUAN Min1, CHENG Zhengbai2, CAO Haibing2, LIU Hongbin1()
Received:
2022-06-16
Revised:
2022-08-12
Online:
2023-05-08
Published:
2023-04-25
Contact:
AN Xingye, LIU Hongbin
万茂华1(), 张小红2, 安兴业1(), 龙垠荧1, 刘利琴1, 管敏1, 程正柏2, 曹海兵2, 刘洪斌1()
通讯作者:
安兴业,刘洪斌
作者简介:
万茂华(1998—),男,硕士研究生,研究方向为MXene复合生物质基储能材料。E-mail:2592701599@qq.com。
基金资助:
CLC Number:
WAN Maohua, ZHANG Xiaohong, AN Xingye, LONG Yinying, LIU Liqin, GUAN Min, CHENG Zhengbai, CAO Haibing, LIU Hongbin. Research progress on the applications of MXene in the fields of biomass based energy storage nanomaterials[J]. Chemical Industry and Engineering Progress, 2023, 42(4): 1944-1960.
万茂华, 张小红, 安兴业, 龙垠荧, 刘利琴, 管敏, 程正柏, 曹海兵, 刘洪斌. MXene在生物质基储能纳米材料领域中的应用研究进展[J]. 化工进展, 2023, 42(4): 1944-1960.
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方法 | 前体 | 化学药品 | MXene | 优点 | 缺点 | 参考文献 |
---|---|---|---|---|---|---|
HF酸蚀刻 | Ti3AlC2 | HF酸 | Ti3C2 | 最广泛的蚀刻方法 | 对环境和人体有害 | [ |
酸/氟盐蚀刻 | V2AlC | HCl+LiF | V2C | 缺陷密度低稳定性高 | F原子的电负性大,降低导电性 | [ |
化学气相沉积(CVD) | Ti3AlC2 | HCl+LiF | Ti3C2 | 晶体横向尺寸大,高温高压下较稳定 | 沉积的反应源和反应后的余气易燃,易爆或有毒 | [ |
碱性蚀刻 | Ti3AlC2 | KOH | Ti3C2 | 提供更多的电活性中心 | 容易产生氢氧化铝覆盖在MAX相阻碍蚀刻 | [ |
高温蚀刻 | Ti4AlN3 | KF+LiF+NaF | Ti4N3 | 通过热能断裂M—A键 | 所需温度较高 | [ |
盐酸蚀刻 | Ti2AlC | HCl | Ti2C | 层间距增加,促进离子嵌入 | 蚀刻的温度,时间较为严苛 | [ |
方法 | 前体 | 化学药品 | MXene | 优点 | 缺点 | 参考文献 |
---|---|---|---|---|---|---|
HF酸蚀刻 | Ti3AlC2 | HF酸 | Ti3C2 | 最广泛的蚀刻方法 | 对环境和人体有害 | [ |
酸/氟盐蚀刻 | V2AlC | HCl+LiF | V2C | 缺陷密度低稳定性高 | F原子的电负性大,降低导电性 | [ |
化学气相沉积(CVD) | Ti3AlC2 | HCl+LiF | Ti3C2 | 晶体横向尺寸大,高温高压下较稳定 | 沉积的反应源和反应后的余气易燃,易爆或有毒 | [ |
碱性蚀刻 | Ti3AlC2 | KOH | Ti3C2 | 提供更多的电活性中心 | 容易产生氢氧化铝覆盖在MAX相阻碍蚀刻 | [ |
高温蚀刻 | Ti4AlN3 | KF+LiF+NaF | Ti4N3 | 通过热能断裂M—A键 | 所需温度较高 | [ |
盐酸蚀刻 | Ti2AlC | HCl | Ti2C | 层间距增加,促进离子嵌入 | 蚀刻的温度,时间较为严苛 | [ |
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