Chemical Industry and Engineering Progree

Previous Articles     Next Articles

Preparation and adsorption behavior of chlorogenic acid imprinted polymer by using nano-TiO2 as sacrificial support material

TAN Xianzhou 1,LI Hui 1,2,LU Cuimei 2,LI Gui 1   

  1. 1 Key Laboratory of Plant Resource Conservation and Utilization of Hunan Province Higher Education Institutions, Jishou University,Jishou 416000,Hunan,China;2 School of Chemistry and Chemical Engineering,Jishou University,Jishou 416000,Hunan,China
  • Online:2013-02-05 Published:2013-02-05

纳米TiO2基绿原酸印迹聚合物的制备及其吸附研究

谭先周1,李 辉1,2,逯翠梅2,李 贵1   

  1. 1吉首大学植物资源保护与利用湖南省高校重点实验室,湖南 吉首 416000;2吉首大学化学化工学院, 湖南 吉首 416000

Abstract: Preparation of chlorogenic acid (CGA) imprinted polymer based on the surface imprinting technique was carried out by using nano-TiO2 as sacrificial support with CGA as template,MAA, EGDMA and AIBN as functional monomer,cross-linker and initiator,respectively. Structural characterization was performed by FTIR and SEM analysis. Static adsorption of the template on the polymers was investigated. The results indicated strong adsorption capability and higher adsorption selectivity (relative selectivity coefficient of 3.353) for the hollow molecularly imprinted polymer (H-MIP) toward the template molecule. Freundlich model was shown better than Langmuir model to describe isotherm adsorption behavior of H-MIP toward the template. This H-MIP also revealed good adsorption capability when it was utilized in solid phase micro-enrichment of chlorogenic acid from the methanol extract of Eucommia ulmoides.

Key words: molecularly imprinted polymers, surface imprinting, nano-TiO2, adsorption

摘要: 以纳米TiO2为牺牲载体,绿原酸为模板分子,甲基丙烯酸(MAA)、二甲基丙烯酸乙二醇酯(EGDMA)及偶氮二异丁腈(AIBN)分别为功能单体、交联剂及引发剂,制备了绿原酸印迹聚合物。用傅里叶红外光谱(FTIR)和扫描电镜(SEM)研究了聚合物结构,静态吸附法研究了模板在聚合物上的结合特性。结果表明:除去纳米TiO2基质后的中空分子印迹聚合物H-MIP对模板分子具有较强的吸附能力和较高的吸附选择性(相对选择系数为3.353)。Freundlich模型比Langmuir模型更适合描述H-MIP对模板的等温吸附。将分子印迹聚合物H-MIP用于对杜仲甲醇提取液中绿原酸进行固相微富集时,表现了较好的吸附效果。

关键词: 分子印迹聚合物, 表面印迹, 纳米TiO2, 吸附

京ICP备12046843号-2;京公网安备 11010102001994号
Copyright © Chemical Industry and Engineering Progress, All Rights Reserved.
E-mail: hgjz@cip.com.cn
Powered by Beijing Magtech Co. Ltd