Chemical Industry and Engineering Progress ›› 2022, Vol. 41 ›› Issue (2): 609-618.DOI: 10.16085/j.issn.1000-6613.2021-0677
• Chemical processes and equipment • Previous Articles Next Articles
ZHANG Tianhao(), XU Haojie, WU Tianyi, LI Bufa, WANG Junfeng()
Received:
2021-04-01
Revised:
2021-05-21
Online:
2022-02-23
Published:
2022-02-05
Contact:
WANG Junfeng
通讯作者:
王军锋
作者简介:
张天昊(1996—),男,硕士研究生,研究方向为荷电多相流技术及应用。E-mail:基金资助:
CLC Number:
ZHANG Tianhao, XU Haojie, WU Tianyi, LI Bufa, WANG Junfeng. Numerical simulation of evaporation and internal flow of substrate droplet under electric field[J]. Chemical Industry and Engineering Progress, 2022, 41(2): 609-618.
张天昊, 许浩洁, 吴天一, 李步发, 王军锋. 电场作用下基面液滴蒸发与内部流动数值模拟[J]. 化工进展, 2022, 41(2): 609-618.
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