Abstract: The preparation technology，present situation of manufacture，and research progress of high purity arsenic are presented. Several preparation methods，such as liquid phase chlorination reduction，gas phase chlorination reduction，sublimation distillation，and thermal decomposition are reviewed. The characteristics，advantages and drawbacks of the methods mentioned above are analyzed. The development trend of preparation of high purity arsenic is prospected. Chlorination reduction and sublimation distillation are the main processes to prepare high purity arsenic at present，however the product is contaminated easily by residue，such as lead and antimony in the distillation process and corrosion of equipment and pollution of environment are involved in the chlorination reduction process. Thermal decomposition of As(OR)3 and arsenic sulfide hydroreduction produce no waste and are prospective in the future.

Key words: high purity arsenic, semiconductor materials, reduction, distillation, pyrolysis

摘要： 阐述了高纯砷的制备技术、生产现状、研究进展及趋势。通过回顾液相氯化-氢还原、气相氯化-氢还原、升华蒸馏及热分解等主要制备高纯砷的研究进展，分析各种制备方法的特点和优劣，对高纯砷制备技术的发展趋势进行展望。结果表明，目前制备高纯砷的主要方法为升华蒸馏法和氯化还原，升华蒸馏法尽管流程短，但存在铅、锑等杂质易污染产品的缺陷，氯化还原法存在氯化氢对设备腐蚀及环境污染的问题；硫化砷氢还原法和As(OR)3热分解法制备过程中无废液、废气和废弃物产生，环境友好，是今后制备高纯的可取方法。

关键词: 高纯砷, 半导体材料, 还原, 蒸馏, 热解