Chemical Industry and Engineering Progree ›› 2016, Vol. 35 ›› Issue (02): 544-548.DOI: 10.16085/j.issn.1000-6613.2016.02.031

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Fabrication and characterazation of anodic alumina with tapered porous structure

XU Yanfang1, LI Xiaojiu1, LIU Hao1,2   

  1. 1 School of Textiles, Tianjin Polytechnic University, Tianjin 300387, China;
    2 Institute of Smart Wearable Electronic Textile, Tianjin 300387, China
  • Received:2015-05-18 Revised:2015-06-05 Online:2016-02-05 Published:2016-02-05

磷酸/草酸混合溶液中锥形多孔阳极氧化铝的制备和表征

徐艳芳1, 李晓久1, 刘皓1,2   

  1. 1 天津工业大学纺织学院, 天津 300387;
    2 智能可穿戴电子纺织品研究所, 天津 300387
  • 通讯作者: 刘皓,副教授,主要从事功能材料与功能性纺织品方面的研究。E-mail:liuhao@tjpu.edu.cn。
  • 作者简介:徐艳芳(1989-),女,硕士研究生。
  • 基金资助:
    国家自然科学基金面上项目(51473122)、国家大学生创新训练计划(201510058034)及天津市高等学校科技发展基金计划(20120321)项目。

Abstract: A method to fabricate highly ordered tapered porous anodic alumina (PAA) templates in mixed solution which contains phosphoric acid and oxalic acid was presented. Firstly,highly ordered PAA templates with interpore distance of 495nm were fabricated by two-step method. On this basis,ordered tapered PAA templates with different aspect ratios were fabricated by alternately performing anodization process and pore widening process. Results showed that the aspect ratio of tapered PAA templates is linearly related to the total anodizing time,which could reach more than 100. And the relationship between tapered PAA morphology and partial anodizing time/partial pore widening time was also discussed in detail. The special structure of nano-template could expand the applications of PAA templates in fabricating metal or semiconductor nanowires,photoelectric materials and polymer materials.

Key words: porous anodic alumina, tapered structure, multi-layer nanostructure

摘要: 提出了以磷酸/草酸混合溶液为电解液制备高度有序锥形多孔阳极氧化铝(PAA)模板的方法。首先采用二次氧化的方法,得到了孔洞排列高度有序且孔间距为495nm的PAA模板。在此基础上,采用阳极氧化过程和扩孔过程交替进行的方法,制备了不同长径比的有序锥形PAA模板。实验结果显示:锥形PAA模板的长径比与总氧化时间线性相关,可达到100以上;还说明了分段氧化时间和分段扩孔时间与锥形孔道形貌之间的关系。这种特殊结构的PAA模板可以大大拓展其在合成金属或半导体纳米线、光电材料以及高分子材料方面的应用范围。

关键词: 多孔阳极氧化铝, 锥形结构, 多层纳米结构

CLC Number: 

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