超临界抗溶剂制粒装置的现状及其展望

化工进展 ›› 2012, Vol. 31 ›› Issue (03): 489-494.

超临界抗溶剂制粒装置的现状及其展望

巫先坤，王志祥，黄德春，蔡锦源，颜庭轩

（中国药科大学药学院，江苏南京 210009）

出版日期:2012-03-05 发布日期:2012-03-05

Present status and prospect of granulation device by using supercritical anti-solvent

WU Xiankun，WANG Zhixiang，HUANG Dechun，CAI Jinyuan，YAN Tingxuan

（School of Pharmaceutical，China Pharmaceutical University，Nanjing 210009，Jiangsu，China）

Online:2012-03-05 Published:2012-03-05

摘要/Abstract

摘要： 超临界抗溶剂法是一种新型超细微粒制备技术，现已在许多领域得到广泛应用。本文简要陈述了超临界抗溶剂技术的基本原理、装置组成和操作方式，详细阐述了超临界抗溶剂装置喷嘴部件的演进，从该角度介绍了GAS制粒装置、ASES制粒装置、SEDS制粒装置和SAA制粒装置的发展和优化历程，并对超临界抗溶剂制粒装置的多功能化、喷嘴的进一步优化、结晶釜的可视化等提出展望。

关键词: 超临界抗溶剂法, GAS制粒装置, ASES制粒装置, SEDS制粒装置, SAA制粒装置

Abstract: As a new micro-particle granulation technology，supercritical anti-solvent has been widely used in many fields. The fundamental principles，apparatus compositions and operation modes of supercritical anti-solvent technology were introduced briefly. The development and optimization process of granulation device of gas anti-solvent（GAS），aerosol solvent extraction system（ASES），solution enhanced dispersion by supercritical fluids（SDES）and supercritical fluid anti-solvent- atomization（SAA）were analyzed from the evolution of the nozzle components of this apparatus. Meanwhile，the prospect in device developing，such as multi-function of the device，further optimization of the nozzle and the crystallization vessel visualization were addressed.

Key words: supercritical anti-solvent, granulation device of GAS, granulation device of ASES, granulation device of SDES, granulation device of SAA

巫先坤，王志祥，黄德春，蔡锦源，颜庭轩. 超临界抗溶剂制粒装置的现状及其展望[J]. 化工进展, 2012, 31(03): 489-494.

WU Xiankun，WANG Zhixiang，HUANG Dechun，CAI Jinyuan，YAN Tingxuan. Present status and prospect of granulation device by using supercritical anti-solvent[J]. Chemical Industry and Engineering Progree, 2012, 31(03): 489-494.