化工进展 ›› 2012, Vol. 31 ›› Issue (03): 489-494.

• 化工过程与装备 • 上一篇    下一篇

超临界抗溶剂制粒装置的现状及其展望

巫先坤,王志祥,黄德春,蔡锦源,颜庭轩   

  1. (中国药科大学药学院,江苏 南京 210009)
  • 出版日期:2012-03-05 发布日期:2012-03-05

Present status and prospect of granulation device by using supercritical anti-solvent

WU Xiankun,WANG Zhixiang,HUANG Dechun,CAI Jinyuan,YAN Tingxuan   

  1. (School of Pharmaceutical,China Pharmaceutical University,Nanjing 210009,Jiangsu,China)
  • Online:2012-03-05 Published:2012-03-05

摘要: 超临界抗溶剂法是一种新型超细微粒制备技术,现已在许多领域得到广泛应用。本文简要陈述了超临界抗溶剂技术的基本原理、装置组成和操作方式,详细阐述了超临界抗溶剂装置喷嘴部件的演进,从该角度介绍了GAS制粒装置、ASES制粒装置、SEDS制粒装置和SAA制粒装置的发展和优化历程,并对超临界抗溶剂制粒装置的多功能化、喷嘴的进一步优化、结晶釜的可视化等提出展望。

关键词: 超临界抗溶剂法, GAS制粒装置, ASES制粒装置, SEDS制粒装置, SAA制粒装置

Abstract: As a new micro-particle granulation technology,supercritical anti-solvent has been widely used in many fields. The fundamental principles,apparatus compositions and operation modes of supercritical anti-solvent technology were introduced briefly. The development and optimization process of granulation device of gas anti-solvent(GAS),aerosol solvent extraction system(ASES),solution enhanced dispersion by supercritical fluids(SDES)and supercritical fluid anti-solvent- atomization(SAA)were analyzed from the evolution of the nozzle components of this apparatus. Meanwhile,the prospect in device developing,such as multi-function of the device,further optimization of the nozzle and the crystallization vessel visualization were addressed.

Key words: supercritical anti-solvent, granulation device of GAS, granulation device of ASES, granulation device of SDES, granulation device of SAA

京ICP备12046843号-2;京公网安备 11010102001994号
版权所有 © 《化工进展》编辑部
地址:北京市东城区青年湖南街13号 邮编:100011
电子信箱:hgjz@cip.com.cn
本系统由北京玛格泰克科技发展有限公司设计开发 技术支持:support@magtech.com.cn