化工进展

• 材料科学与技术 • 上一篇    下一篇

硅烷偶联剂KH570对纳米SiO2的表面改性及其分散稳定性

苏瑞彩,李文芳,彭继华,杜 军   

  1. 华南理工大学材料科学与工程学院
  • 出版日期:2009-09-05 发布日期:2009-09-05

Surface modification of nano-sized SiO2 with silane coupling agent and its dispersion

SU Ruicai,LI Wenfang,PENG Jihua,DU Jun   

  1. College of Material Science and EngineeringSouth China University of Technology
  • Online:2009-09-05 Published:2009-09-05

摘要: 采用硅烷偶联剂KH570对纳米SiO2实现表面改性,并利用透射电镜(TEM)、粒径分析、Zeta电位、红外光谱(FTIR)等方法对改性后纳米SiO2的表面结构和在有机介质中的分散稳定性进行分析表征。结果表明,通过硅烷偶联剂KH570表面改性后,颗粒表面覆盖了硅烷偶联剂的有机官能团,提高了SiO2纳米颗粒在水溶液中的Zeta电位,降低了颗粒团聚程度。改性后的纳米SiO2粉体在有机溶剂中的团聚块体尺寸明显减小,从200 nm降低到不足100 nm

Abstract: Nano-sized SiO2 was surface modified with silane coupling agent KH570. The role of surface modification was characterized by TEMZeta potential analysisand FTIR. It was found that the surface of nano-sized SiO2 is covered by organic functional groups from KH570. After surface modificationthe Zeta potential and dispersion of nano-sized SiO2 are improved greatly. The statistical size of particle conglomeration of nano-sized SiO2 is reduced from 200 nm before modification to less than 100nmstability after the modification.

京ICP备12046843号-2;京公网安备 11010102001994号
版权所有 © 《化工进展》编辑部
地址:北京市东城区青年湖南街13号 邮编:100011
电子信箱:hgjz@cip.com.cn
本系统由北京玛格泰克科技发展有限公司设计开发 技术支持:support@magtech.com.cn