Chemical Industry and Engineering Progress ›› 2021, Vol. 40 ›› Issue (9): 5231-5235.DOI: 10.16085/j.issn.1000-6613.2021-1171

Previous Articles    

Progress and prospects of electronic-grade monosilane commercialization in China

LI Xuegang(), XIAO Wende()   

  1. School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
  • Received:2021-05-30 Revised:2021-06-18 Online:2021-09-13 Published:2021-09-05
  • Contact: XIAO Wende

电子特气甲硅烷的国产化实践及行业展望

李学刚(), 肖文德()   

  1. 上海交通大学化学化工学院,上海 200240
  • 通讯作者: 肖文德
  • 作者简介:李学刚(1986—),男,副研究员,研究方向为反应工程、分离工程。E-mail:xuegangli@sjtu.edu.cn
  • 基金资助:
    国家自然科学基金(22008152)

Abstract:

High-purity monosilane is the most important silicon-containing gas in semiconductor industry, and is widely used in areas such as integrated circuit, photovoltaics, display panel, and battery cells for electric vehicle. However, it has previously been a monopoly of the US, Japan, South Korea, et al. This article reviewed the localization journey of monosilane technology, and introduced the new mass production technology of high-purity monosilane innovated by the authors' group based on the chlorosilane route and the reactive distillation technology, the product of which had been delivered to fields including photovoltaic, display panel, integrated circuit and so on. Prospects of the electronic-grade monosilane industry was presented, holding that represented by the authors' approach, the chlorosilane route would be in the mainstream in future, while the magnesium silicide route would be a convenient way for co-production of monosilane and disilane. It was also pointed out that developing platform enterprises via integration and innovation of associated technologies for multiple products or co-products would be the development direction of monosilane industry.

Key words: silane, electronic special gas, chlorosilane, electronic material, electronic chemical

摘要:

高纯甲硅烷是半导体工业中最重要“源”性气体,广泛应用于集成电路、太阳能光伏、显示面板及车用动力电池等领域,曾被美、日、韩等国垄断。本文回顾了甲硅烷技术的国产化之路,指出氯硅法路线和反应精馏技术,创新高纯甲硅烷大规模生产新工艺,产品打破国外技术垄断并先后导入光伏、显示面板、集成电路等领域。本文还对甲硅烷电子特气行业进行展望,指出本文作者课题组为代表开发的氯硅法路线是未来的主流工艺,而镁硅法联产甲硅烷和乙硅烷也可能是一条较好路线,并认为通过技术整合和工艺创新开发多产品和多联产产品,发展平台型企业,是未来行业发展的方向。

关键词: 硅烷, 电子特气, 氯硅烷, 电子材料, 电子化学品

CLC Number: 

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